Metavision-8i latest generation , High resolution CMOS detectors, 2 analysis chambers, High precision metal analysis.

in the field of precise analysis of metal composition of emission spectrometers, Other markers focus on design. " low detection limits and faster analysis times with high accuracy and reliability". Metal Power, We have R&D Department (more than 35 years), not onely focus on these but forget about the need to provide "most economical solution" throughout the product life cycle. Metavision-8i is a testament to all these efforts. - Metavision-8i Provides powerful, fast, accurate and highly reliable analysis for a wide range of, All black metal and colored metal, Brings many special economic values ​​to metal/alloy quality control, optimizes production costs, enhances product quality reputation for metallurgical enterprises...

Advanced optical system

Metavision-8i Dual-optics system with dedicated optics, Engineered for superior performance across the wavelength range 140-620 nm.  Dual-optics system incorporates dedicated optics for the Deep Ultraviolet (DUV) spectrum, ranging from 140 to 220 nm. This is crucial for detecting elements with strong absorption lines in this region, such as Carbon (C), Sulphur (S), Phosphorus (P), Boron (B) and Nitrogen (N).

Metavision-8i Provides violation analysis of more 50 elements,  with detection limits as low as ≤20 ppm for Carbon and Sulfur in Steel and Cast Iron, down to 20 ppm for Nitrogen. Additionally, Metavision-8i excels in analysing non-ferrous metals , achieving purities of 99.9+% for all pure metals, and exceeding 99.98% for elements such as Copper (Cu) and Lead (Pb). Metavision-8i also sets a new standard for accuracy provides flexibility for a wide variety of analytical applications.

 Powering the best results

The Metavision-8i innovative, fully digital pulsed currentcontrolled power source offers precise, computer-controlled adjustments across a broad range of discharge parameters. This ensures optimal plasma generation and tailored spectral output for each element and application. With inputs ranging from 90 - 270 VAC, offering unparalleled ňexibility and reliability in any part of the world.

Modular design

The Metavision-8i is engineered for easy servicing and maintenance, featuring a fully modular design that ensures optimised isolation of subsystems. This design prevents interference and noise and enables quick and straightforward access for maintenance and servicing. Engineers can independently access each system without disturbing other components, ensuring that critical subsystems remain protected during routine tasks such as cleaning or consumable replacement. This approach minimises downtime, enhances reliability, and reduces overall maintenance costs, making the Metavision-8i an exceptionally service-friendly instrument

12 point outstanding

• Range wavelength 140-620nm, Analysis up more 50 elements (configuration options).
• Merge 10 matrix metal different  (Base): Stell, Aluminum , Copper, Lead, Zinc, Tin, Titanium,...
• Dual-optics system with dedicated optics for the Deep UV spectru.
• Fully  CMOS design using latest-generation, high resolution CMOS detectors.
• On the analytical to ppm of C, S, P, N in Stell and Cast iron  ≤20ppm.
• Analyzable P, Li và Na in Aluminum.
• The temperature in the analysis chamber is stable, ensure stability and accuracy for analysis.
• High voltage power supply can automatically control current, ensure stable results.
• Latest software version,for noise-free clear spectra for low detection limits, ensuring uncompromised accuracy.
• Grade IdentiŅcation library for quick identiŅcation of grade and matrix.
• Vacuum-free optics enabling lower capital and maintenance costs and very rapid stabilisation.
• Special applications for small samples, wire rods (2.2 mm dia.), thin sheets (0.05 mm thickness), and many more.

Specifications

Optics:

• Dual-optics system with dedicated optics for the Deep UV spectru.
• Wavelength span of 140-620 nm.
• Fully CMOS design using latest-generation, high resolution CMOS detectors.
• Reciprocal Linear Dispersion (RLD): 1.6 nm/mm.
• Thermally stabilised optics to ensure high precision and stability.

Source:

• Digital, current-controlled source for plasma generation.
• Peak Discharge Current: 100 A.
• Maximum Discharge Frequency: 1000 Hz.
• 90-270 VAC; 50/60 Hz.